PECVD (Plasma Enhanced Chemical Vapor Deposition): A strong electric field (glow discharge) or magnetic field is used to ionize the required gas source molecules to produce a plasma. The plasma contains many highly active chemical groups. These groups undergo a series of chemical and plasma reactions to form a solid film on the surface of the sample.

Its main function is to coat a SIN film on the surface of solar cells and silicon wafers. This film can reduce the reflectivity of sunlight and increase photoelectric conversion efficiency. It also has good oxidation resistance and insulation properties, as well as good ability to mask the diffusion of metal and water ions, and good chemical stability. Except for hydrofluoric acid and hot phosphoric acid, which can corrode slowly, other acids basically have no effect.